Our High Frequency RF Power Supplies are designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, ICP, RF sputtering, PECVD, and solar photovoltaic applications. Additional applications include induction and dielectric heating processes in industrial systems.
CB Series
The CB series is the culmination of 45 years of RF plasma and heating experience. We have taken the proven rugged design of the CX series power amplifier section and combined it with all the innovation in DC supplies and diagnostics to make a compact, stable RF power supply without compromising reliability for size.
Performance
RF generators from the CB product family are available in power ranges from 50 to 5000 Watts with standard fixed frequencies from 13.56 MHz to 60 MHz. The solid-state design provides precise and repeatable power control, ultra-stable output and low cost of ownership. The design of the CB series is based on XP Power's proven RF amplifier technology.
Features
- Small, lightweight packaging
- Standard fixed frequencies: 3.39 MHz to 30 MHz
- Designed to meet ETL and SEMI F47 directives
- Forward or Delivered power mode regulation
- Patented S-Technology provides ultra-stable output. This stabilizing technology optimizes amplifier performance, reducing power-gain changes caused by plasma impedance fluctuations.
Applications
The CB series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, ICP, RF sputtering and PECVD, as well as induction and dielectric heating processes in industrial systems, and solar photovoltaic applications.
Our Low Frequency RF Power Supplies are designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, ICP, RF sputtering, PECVD, and solar photovoltaic applications. Additional applications include induction and dielectric heating processes in industrial systems.
CLB Series
The CLB series incorporates all of the features and innovations developed in the previous CLF series with the added advantage of lighter weight and smaller size.
Performance
RF generators from the CLB product family are available in power ranges from 2500 to 12,000 Watts at a single frequency in the 20 kHz to 2 MHz band. The Turbotune Technology within the unit allows frequency tuning by automatically varying its output frequency +/-10% around its nominal frequency. The solid-state design provides precise and repeatable power control, ultra-stable output and low cost of ownership.
Features
- Small, lightweight packaging
- Standard power ranges: 1250, 3000 Watts
- Any single frequency from 20 kHz to 2 MHz, varying +/-10%
- Phase lock tuning or software algorithm
- Designed to meet ETL and SEMI F47 directives
- Forward or Delivered power mode regulation
Applications
The CLB series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems.
CDX Series
- Simplify Operations and Reduce Costs Without Sacrificing Performance
- Compact packaging reduces space, service (electrical and plumbing), and spare inventory requirements.
Performance
The CDX dual frequency RF generator is offered in a design up to a 3000 watts. The high frequency (HF) section of the CDX provides up to 1500 watts of power, with optional frequencies from 2 to 60 MHz. The low frequency (LF) section can deliver 1500 watts, with optional fixed or variable frequencies ranging from 20 kHz to our new 13.56 MHz. It can be configured as two LF sections or two HF sections or one HF and one LF section.
Features
- Complies to CE-Mark standards and is ETL Marked and SEMI F47 compliant
- Protection circuits safeguard the amplifiers from over-voltage, over-current and over-power operating conditions
- Gain-control circuitry stabilizes output power against line and load variations, and limits power during high VSWR conditions
- Unique power monitoring in the low-frequency section measures delivered power into any impedance load
- Optional fast frequency tuning available in the low- frequency section eliminates the need for a matching network in many applications
Applications
Applications include etch, ICP, RF sputtering, PECVD, and solar photovoltaic applications. Additional applications include induction and dielectric heating processes in industrial systems
Match Pro Matching Networks
- Fast Tuning and Fine Tune Resolution Deliver Repeatable Process Results
- Custom Designs to Fit Your Specific Application
Performance
All Match Pro impedance matching networks are engineered with XP Power's unique PROTRAK, a high-speed tuning algorithm that gradually slows the system as it approaches the tuning point, allowing a precise match even in high "Q" loads. This proportional control circuitry illustrates the critical difference between XP Power's Match Pro and other matching networks. The Match Pro adjusts input impedance to 50 Ohms quickly, accurately and dependably—in response to the changes in load characteristics during your process. The Match Pro operates over a power range from 50 to 50,000 Watts.
Features
- Automatic and manual modes with local and remote manual control of tuning capacitors
- Ability to pre-position capacitors to optimal plasma ignition point prior to turn on, resulting in quick and reliable tuning
- Capacitor position outputs to show where the match occurs from process to process
- High power, H-bridge, Mosfet motor drive circuitry is conservatively rated for improved reliability
- Optional BLDC motors and drive for improved motor life cycle
- Optional DC Bias and RF VP-P detector circuits available